PLD (Pulsed Laser Deposition) is a technology that allow transfer of a material from a target to a substrate with the composition/stochiometry intact.

With PLD ceramic materials like oxides, nitrides and also metals and alloys, are transferred without change. The PLD equipment is complete with laser, chamber, gases, pumps, gauges... it is even delivered under vacuum. Installation time is just a few hours.

  This PLD equipment applies an advanced technique for controlling film thickness and evenness, built on careful calculations and control of rotation and movement of target and substrate stages. This allows for an economical use of target and an optimal production of coatings. The basic system has ports for additional optional products like RHEED (Reflection High Energy Electron Diffraction) and a laser heater. The RHEED is designed to work even at pressure levels of up to 300 mtorr. The substrate stage allows tilting +/- 3 degrees , which will give optimal conditions for good RHEED images.

A larger system for Laser MBE (Molecular Beam Epitaxy), called Laser Star, is also available. It has a central UHV chamber, to which as many as five different process chambers can be added. This allows complex processing without venting the substrate. Also here RHEED and Laser Heaters can be used, as well as processes like sputtering and e-beam evaporation.

A brochure describing the PLD workstation is also availible: PLD workstation brochure.

Contact us at K-analys for more information!